Volume | 409,158 |
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News | - | ||||||
Day High | 787.91 | Low High |
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Day Low | 765.42 |
Share Name | Share Symbol | Market | Stock Type |
---|---|---|---|
KLA Corporation | KLAC | NASDAQ | Common Stock |
Open Price | Low Price | High Price | Close Price | Previous Close |
---|---|---|---|---|
787.50 | 765.42 | 787.91 | 779.26 |
Trades | Shares Traded | VWAP | Financial Volume | Average Volume | 52 Week Range |
---|---|---|---|---|---|
25,302 | 409,158 | US$ 774.40 | US$ 316,851,243 | - | 440.15 - 791.96 |
Last Trade | Type | Quantity | Price | Currency |
---|---|---|---|---|
14:07:54 | 1 | US$ 765.74 | USD |
KLA (KLAC) Options Flow Summary
KLA Corporation Financials
Market Cap | Shares in Issue | Float | Revenue | Profit/Loss | EPS | PE Ratio |
---|---|---|---|---|---|---|
103.77B | 135.23M | - | 10.5B | 3.39B | 25.05 | 30.63 |
Short Interest | Dividends Per Share | Dividend Yield | Ex-Div Date | Insider B/S | Insider % Owned |
---|---|---|---|---|---|
- | - | - | - |
KLA News
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Historical KLAC Price Data
Period † | Open | High | Low | VWAP | Avg. Daily Vol | Change | % |
---|---|---|---|---|---|---|---|
1 Week | 770.72 | 787.43 | 735.5607 | 766.72 | 867,783 | -5.13 | -0.67% |
1 Month | 720.00 | 791.96 | 705.18 | 760.95 | 745,261 | 45.59 | 6.33% |
3 Months | 687.95 | 791.96 | 623.17 | 707.69 | 835,758 | 77.64 | 11.29% |
6 Months | 535.09 | 791.96 | 530.07 | 657.47 | 908,328 | 230.50 | 43.08% |
1 Year | 463.99 | 791.96 | 440.15 | 568.74 | 938,104 | 301.60 | 65.00% |
3 Years | 315.38 | 791.96 | 250.20 | 413.83 | 1,194,850 | 450.21 | 142.75% |
5 Years | 108.65 | 791.96 | 107.69 | 320.59 | 1,253,980 | 656.94 | 604.64% |
KLA Description
KLA designs and manufactures yield-management and process-monitoring diagnostic and control systems for the semiconductor industry. The systems are used to analyze the manufacturing process at various steps in a semiconductor's development. The firm's laser-scanning products are used for wafer qualification, process monitoring, and equipment monitoring. KLA also provides inspection tools and systems for optical metrology and e-beam metrology. |