Novellus Systems, IBM and the UAlbany NanoCollege Establish Strategic Partnership at CNSE's Albany NanoTech Complex
February 11 2010 - 8:00AM
PR Newswire (US)
First Program Targets Development of Photoresist Strip Processes
for Advanced Computer Chip Technologies SAN JOSE, Calif., EAST
FISHKILL, N.Y. and ALBANY, N.Y., Feb. 11 /PRNewswire-FirstCall/ --
Novellus Systems (NASDAQ:NVLS), IBM Corporation (NYSE:IBM) and the
College of Nanoscale Science and Engineering (CNSE) today announced
the establishment of a strategic partnership at CNSE's Albany
NanoTech Complex targeting the development of semiconductor process
solutions for 22nm and beyond nanoelectronics technologies. The
most advanced semiconductors in volume production today have 45 and
32nm circuitry, with devices at 28nm and below under development.
The move to each technology generation can result in smaller,
faster, more efficient chips that improve the performance of
products ranging from servers to smartphones. Novellus joins the
ecosystem of semiconductor companies at CNSE's Albany NanoTech
Complex that are working with IBM, its technology alliance
partners, and CNSE research teams to address the challenges of
moving to each technology generation. The first project under this
agreement is designed to enable advanced, residue-free photoresist
strip technologies for leading-edge processes for the 28nm and 22nm
nodes. Photoresist stripping is a critical process step for
defining the wiring in a semiconductor chip. The scope of the
collaboration will encompass a range of photoresist removal
processes, including high-dose implant strip (HDIS) processes that
are compatible with high-k metal gate technology, and damage-free
etch strip chemistry used for ultra-low-k dielectric structures.
IBM brings to the collaboration extensive semiconductor technology
experience and a proven track record of technology development and
manufacturing that can help accelerate development of 28nm and
smaller technology dimensions. Novellus' GxT® advanced photoresist
strip platform will be used at IBM's East Fishkill facility and
CNSE's Albany NanoTech Complex for these new, sophisticated strip
applications. Novellus has demonstrated industry-leading cleaning
results on the GxT platform using specialized, non-oxidizing strip
chemistries that can achieve a silicon and oxide loss of less than
0.1nm. CNSE provides world-class intellectual capital and
unparalleled technological infrastructure at its Albany NanoTech
Complex, the most advanced in the academic world. "IBM is committed
to working with Novellus Systems and the College of Nanoscale
Science and Engineering in this newly-established technology
collaboration, where our initial focus is on optimizing these
advanced photoresist strip technologies for our industry-leading
high-k metal gate transistor structures," said Paul Farrar, vice
president of process development, IBM. "Close collaboration with
equipment suppliers through the consortium of world-class companies
at CNSE's Albany NanoTech is critical to bringing leading-edge
technology to market for the benefit of IBM and its alliance
partners." "IBM has a long-standing reputation for developing
state-of-the-art semiconductor manufacturing processes," said Tim
Archer, Novellus' executive vice president of worldwide sales,
marketing, and customer satisfaction. "Novellus is excited to be
working with IBM and CNSE in this strategic partnership focused on
advancing the science of photoresist strip and clean." "The UAlbany
NanoCollege looks forward to working in partnership with industry
leaders Novellus Systems and IBM to accelerate the development and
deployment of innovative technologies that will support
nanoelectronics manufacturing," said Richard Brilla, vice president
for strategy, alliances and consortia for CNSE. "This collaboration
will enable the integration of leading-edge process and equipment
technologies to help address the critical needs of industry,
further demonstrating the technology leadership of IBM and its
alliance partners." About IBM: For more information about IBM's
semiconductor products and services, visit
http://www.ibm.com/technology. About Novellus: Novellus' GxT
photoresist strip system is designed for critical logic device
manufacturing process steps that demand low silicon loss and
ultra-low defectivity. Novellus Systems, Inc. (NASDAQ:NVLS) is a
leading provider of advanced process equipment for the global
semiconductor industry. The company's products deliver value to
customers by providing innovative technology backed by trusted
productivity. An S&P 500 company, Novellus is headquartered in
San Jose, Calif. with subsidiary offices across the globe. For more
information please visit http://www.novellus.com/ About CNSE: The
UAlbany CNSE is the first college in the world dedicated to
education, research, development, and deployment in the emerging
disciplines of nanoscience, nanoengineering, nanobioscience, and
nanoeconomics. CNSE's Albany NanoTech Complex is the most advanced
research enterprise of its kind at any university in the world.
With over $5 billion in high-tech investments, the
800,000-square-foot complex attracts corporate partners from around
the world and offers students a one-of-a-kind academic experience.
The UAlbany NanoCollege houses the only fully-integrated, 300mm
wafer, computer chip pilot prototyping and demonstration line
within 80,000 square feet of Class 1 capable cleanrooms. More than
2,500 scientists, researchers, engineers, students, and faculty
work on site at CNSE's Albany NanoTech. For more information, visit
http://www.cnse.albany.edu/. Novellus and GxT are registered
trademarks of Novellus Systems, Inc. DATASOURCE: Novellus Systems,
Inc. CONTACT: Bob Climo of Novellus, +1-408-943-9700, ; or Jeff
Couture of IBM, +1-802-769-2483, ; or Steve Janack of UAlbany CNSE,
+1-518-956-7322, Web Site: http://www.novellus.com/
http://www.ibm.com/ http://cnse.albany.edu/
Copyright