SAN FRANCISCO, July 12, 2016 /PRNewswire/ -- At SEMICON West,
Bruker today announced that multiple leading logic and foundry
manufacturers have selected Bruker's JVX7300LSI X-ray
metrology system to support their ramp and development for
10 nanometer (nm) and 7/5 nm technology nodes. The
JVX7300LSI tool is equipped with both large and small
spot measurement capabilities for in-line production process
monitoring of the most advanced logic devices. The tool was
selected by the manufacturers following a comprehensive evaluation
of extremely challenging measurements across a variety of front-end
applications, including SiGe and Ge epitaxial analysis on Si and
SRB, finFETs and (FD)SOI, III-V, and other materials such as
high-k/metal gate characterization.
![Bruker's JVX7300LSI X-Ray Metrology System Bruker's JVX7300LSI X-Ray Metrology System](https://photos.prnewswire.com/prnvar/20160711/388384)
"We are delighted to have been selected by industry-leading
semiconductor customers to provide an unparalleled metrology
solution for advanced epitaxial processes," said David V. Rossi, President of the Bruker
Semiconductor Division. "Strengthening our position in fab-based
X-ray metrology was part of the rationale behind Bruker's
acquisition of Jordan Valley Semiconductors in 2015, and we view
this selection as further proof of our technology leadership as a
provider of advanced X-ray based solutions."
"As the industry moves to 10 and 7/5 nanometers, new metrology
requirements and challenges are presented," added Isaac Mazor, Vice President and General Manager
of Bruker's X-ray Semiconductor business. "The
JVX7300LSI system is an ideal tool for a wide range
of applications, providing the metrology required to overcome many
challenges during the development and manufacturing of these
processes. It is capable of a wide range of X-ray based
characterization and metrology techniques—HRXRD, XRR and various
XRD geometries—and is optimized for both blanket and pattern
wafers, all on a single system."
About the JVX7300LSI System
The
JVX7300LSI is a production-worthy X-ray metrology
system for advanced logic and "More-than-Moore" applications, such
as III-V compound semiconductors on Si, and can be used for both
in-fab process development and production monitoring. The tool
supports a wide range of X-ray metrology modes to provide solutions
for a large variety of materials and structures. It is capable of
measuring the composition, thickness and strain/relaxation of
single and multiple epilayer stacks using both large- and
small-spot HRXRD. Additionally, with XRR and (GI)XRD channels,
JVX7300LSI can also provide information on the
thickness and density of a wide range of thin films, as well as
unique microstructure information, such as crystallinity,
grain-size and phase, of polycrystalline thin-films. Unlike optical
or spectroscopic tools, HRXRD (high-resolution X-ray diffraction)
and XRR (X-ray reflectometry) are first principle techniques that
deliver accurate and precise results without calibration.
About Bruker Corporation (NASDAQ: BRKR)
For more than 50 years, Bruker has enabled scientists to make
breakthrough discoveries and develop new applications that improve
the quality of human life. Bruker's high-performance scientific
research instruments and high-value analytical solutions enable
scientists to explore life and materials at molecular, cellular and
microscopic levels.
In close cooperation with our customers, Bruker is enabling
innovation, productivity and customer success in life science
molecular research, in applied and pharma applications, in
microscopy, nano-analysis and industrial applications, as well as
in cell biology, preclinical imaging, clinical research,
microbiology and molecular diagnostics. For more information,
please visit: www.bruker.com.
Photo -
http://photos.prnewswire.com/prnh/20160711/388384
To view the original version on PR Newswire,
visit:http://www.prnewswire.com/news-releases/leading-logic-and-foundry-manufacturers-select-bruker-x-ray-metrology-tools-300296905.html
SOURCE Bruker Corporation