ACM Research Announces Qualification of High-Temperature SPM Tool for Customer in China
March 03 2025 - 3:05PM
ACM Research, Inc. (“ACM”) (NASDAQ: ACMR), a leading supplier of
wafer processing solutions for semiconductor and advanced packaging
applications, today announced its Single-Wafer High-Temperature
Sulfuric Peroxide Mixture (SPM) tool has been qualified by a key
logic device manufacturer in mainland China. To date, ACM has
delivered its SPM tools to thirteen customers. The system features
ACM’s proprietary nozzle design, which prevents acid mist splatter
during the SPM process, improving particle performance, reducing
chamber preventive maintenance cleaning frequency, and enhancing
system uptime. It supports wet etching and wafer cleaning for both
front- and back-end processes at 28-nanometer (nm) and below
technology nodes.
“The Single-Wafer Moderate/High-Temperature SPM
tool is a prime example of ACM’s commitment to innovation in
solving customers’ challenges in high-volume 300mm semiconductor
manufacturing. We’re already seeing great interest across our
global customer base in this tool,” said Dr. David Wang, ACM’s
President and Chief Executive Officer. “The
Moderate/High-Temperature SPM represents a growing portion of the
wafer-cleaning equipment market, especially High-Temperature SPM
tool, which plays a critical role in manufacturing next-generation
semiconductor devices.”
ACM’s Single-Wafer Moderate/High-Temperature SPM
tool is suitable for a variety of front- and back-end wet etching
and cleaning processes, including low-to-medium temperature
sulfuric acid cleaning at 90 degrees Celsius (°C), high-temperature
sulfuric acid photoresist stripping at 170°C, and ultra-high
temperature sulfuric acid metal lift-off at 190°C. As semiconductor
process nodes advance, the demand for single-wafer high-temperature
sulfuric acid processing is increasing significantly. This trend
brings increasingly stringent requirements for particle control,
chamber environment management, and sulfuric acid temperature
stability. In response to these challenges, ACM has introduced an
innovative design for its Single-Wafer Moderate/High-Temperature
SPM tool, positioning it as a ready-to-deploy solution to meet the
evolving needs of the industry. ACM’s proprietary technologies
integrated into the tool include:
- A multi-level heating method that
ensures the highest mixed temperature exceeds 230℃ and is steadily
controlled.
- An SPM nozzle design that prevents
high-temperature SPM from splashing outside the chamber; it
achieves better particle control with an average particle count of
fewer than 10 at 26nm.
The Single-Wafer Moderate/High-Temperature SPM
tool is equipped with an inline chemical mixing system and a
configurable process chamber that accommodates various chemical
solutions. It can also be seamlessly integrated with ACM's patented
SAPS and TEBO megasonic technologies to enhance organic contaminant
removal and improve wafer surface preparation.
About the ACM Single-Wafer Moderate/
High-Temperature SPM Tool ACM’s Single-Wafer
Moderate/High-Temperature SPM tool is designed for various
wet-etching processes and both single- and double-sided cleaning.
It is compatible with a wide range of chemicals and cleaning
processes. By effectively removing organic defects while minimizing
film loss, it outperforms most post-cleaning and photoresist wet
stripping processes. Supporting wafer sizes from 150mm to 300mm,
the system features four load ports, a configurable setup of 8 to
12 chambers, a multifunctional chemical distribution system, and a
self-cleaning chamber.
Forward-Looking Statements
Certain statements contained in this press release are not
historical facts and may be forward-looking statements within the
meaning of the Private Securities Litigation Reform Act of 1995.
Words such as “plans,” “expects,” “believes,” “anticipates,”
“designed,” and similar words are intended to identify
forward-looking statements. Forward-looking statements are based on
ACM management’s current expectations and beliefs and involve a
number of risks and uncertainties that are difficult to predict and
that could cause actual results to differ materially from those
stated or implied by the forward-looking statements. A description
of certain of these risks, uncertainties and other matters can be
found in filings ACM makes with the U.S. Securities and Exchange
Commission, all of which are available at www.sec.gov. Because
forward-looking statements involve risks and uncertainties, actual
results and events may differ materially from results and events
currently expected by ACM. Readers are cautioned not to place undue
reliance on these forward-looking statements, which speak only as
of the date hereof. ACM undertakes no obligation to publicly update
these forward-looking statements to reflect events or circumstances
that occur after the date hereof or to reflect any change in its
expectations with regard to these forward-looking statements or the
occurrence of unanticipated events.
About ACM Research, Inc.ACM develops,
manufactures and sells semiconductor process equipment spanning
cleaning, electroplating, stress-free polishing, vertical furnace
processes, track, PECVD, and wafer- and panel-level packaging
tools, enabling advanced and semi-critical semiconductor device
manufacturing. ACM is committed to delivering customized,
high-performance, cost-effective process solutions that
semiconductor manufacturers can use in numerous manufacturing steps
to improve productivity and product yield. For more information,
visit www.acmr.com.
© ACM Research, Inc. ULTRA C, SAPS, TEBO and the ACM Research
logo are trademarks of ACM Research, Inc. For convenience, these
trademarks appear in this press release without ™ symbols, but that
practice does not mean ACM will not assert, to the fullest extent
under applicable law, its rights to such trademarks. All other
trademarks are the property of their respective owners.
Media
Contact: |
Company
Contacts: |
Alyssa Lundeen |
USA |
Kiterocket |
Robert Metter |
+1 218.398.0776 |
+1 503.367.9753 |
alundeen@kiterocket.com |
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China |
|
Xi Wang |
|
ACM Research (Shanghai),
Inc. |
|
+86 21 50808868 |
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Korea |
|
David Kim |
|
ACM Research (Korea),
Inc. |
|
+82 1041415171 |
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Taiwan |
|
David Chang |
|
+886 921999884 |
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Singapore |
|
Adrian Ong |
|
+65 8813-1107 |
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